American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML’s EUV scanners

American startup Substrate is developing a new X-ray lithography (XRL) system, powered by a particle accelerator-based light source, that promises superior performance and cost efficiency compared to standard EUV lithography, aiming to achieve resolutions equivalent to ASML’s 2nm-class processes. The firm also claims it can advance beyond that. Substrate also claims that its efforts will be cheaper to produce than the competition’s and will offer finer resolutions before 2030, as the company detailed…