China may have reverse engineered EUV lithography tool in covert lab, report claims — employees given fake IDs to avoid secret project being detected, prototypes expected in 2028

A secret laboratory in China has quietly assembled a prototype extreme ultraviolet (EUV) lithography system and is now testing it stealthily, which means that the country may be close to replicating the most advanced technology that currently exists on Earth, reports Reuters.

The tool was reportedly developed by reverse engineering existing scanners from ASML and is said to be on-track to make prototype chips in 2028. If the information is correct, then Chinese scientists have made numerous…