Intel installs industry’s first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A

Intel announced that it had installed ASML’s Twinscan EXE:5200B, the industry’s first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The tool has passed acceptance testing and will be used for development of Intel’s 14A fabrication process, which will be the world’s first node to rely on High-NA EUV scanners for its most critical layers. The achievement indicates that High-NA EUV lithography is moving beyond early experimentation toward…