Japan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of patterning logic with a feature size of 1.4nm, with plans for mass production in 2027. Canon, which has spent years pursuing nanoimprint lithography as a lower-power alternative to EUV, is already shipping its first 300mm tools to early research partners.
Together, the companies are pointing to imprinting as a way to cut lithography power consumption by up to 90% for advanced nodes. With TSMC and…
